Study on excitation temperatures of a novel microwave plasma enhanced glow discharge source

Fenxi Huaxue

Volumn 24, Issue 1, 1996, Pages 18-

  Li, Yimu ^a   Du, Zhaohui ^a   Zhang, Hanqi ^a   Duan, Yixiang ^a   Jin, Qinhan ^a   Liu, Hongshi ^a  

^a JILIN UNIVERSITY   (China)

Author keywords

Excitation temperature; Glow discharge source; Microwave plasma

Indexed keywords

EID: 9644279653     PISSN: 02533820     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (5)

1. Leis F, Broekaert J A C, Laqua K. Spectrochim. Acta, 1987, 42B:1169
2. Kornblum G R, de Galan L. Spectrochim. Acta, 1977, 32B:71
3. Kalnicky D J, Fassel V A, Kniseley R N. Appl. Spectrosc. , 1977, 31(2):137