Chemical vapor deposition of niobium disulfide thin films

European Journal of Inorganic Chemistry

Volumn , Issue 22, 2004, Pages 4470-4476

  Carmalt, Claire J ^a   Peters, Emily S ^a   Parkin, Ivan P ^a   Manning, Troy D ^a   Hector, Andrew L ^b  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

^b UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

Author keywords

Chemical vapor deposition; Niobium disulfide; Thin films

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; CHLORINE COMPOUNDS; ENERGY DISPERSIVE X RAY ANALYSIS; GLASS SUBSTRATES; NIOBIUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; CHEMICAL VAPOUR DEPOSITION; DEPOSITION REACTIONS; GLASS SUBSTRATES; GROWTH MECHANISMS; ISLANDS GROWTH; IT STRUCTURES; POLYTYPES; SULFUR PRECURSOR; THIN-FILMS;

SULFUR COMPOUNDS;

DISULFIDE; NIOBIUM; SILICON DERIVATIVE; SULFUR DERIVATIVE;

ARTICLE; ATMOSPHERIC PRESSURE; CHEMICAL ENGINEERING; CRYSTAL STRUCTURE; CRYSTALLIZATION; FILM; HIGH TEMPERATURE; MATERIAL COATING; RAMAN SPECTROMETRY; SCANNING ELECTRON MICROSCOPY; VAPOR; X RAY ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY; X RAY POWDER DIFFRACTION;

EID: 9644275781     PISSN: 14341948     EISSN: None     Source Type: Journal    
DOI: 10.1002/ejic.200400308     Document Type: Article

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