Realization of RF microinductors with magnetic cores for high quality factor applications

Journal of Magnetism and Magnetic Materials

Volumn 272-276, Issue SUPPL. 1, 2004, Pages

  Leiste, H ^a   Seemann, K ^a   Bekker, V ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

Inductor; RF application; Thin film

Indexed keywords

ANISOTROPY; FERROMAGNETIC MATERIALS; HEAT TREATMENT; IRON COMPOUNDS; MAGNETRON SPUTTERING; PHOTOLITHOGRAPHY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

CAPACITORS MICROINDUCTORS; INDUCTORS; PLASMA BEAM ETCHING; RF APPLICATIONS;

CMOS INTEGRATED CIRCUITS;

EID: 9444268184     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2003.12.134     Document Type: Conference Paper

References (3)

1. I. Fergen, K. Seemann, A. von der Weth, A. Schüppen, J. Magn. Magn. Mater. 242-245 (2002) 141.
2. A. von der Weth, J. Aktaa, J. Magn. Magn. Mater. 242-245 (2002) 1206.
3. K. Seemann, H. Leiste, V. Bekker, J. Magn. Magn. Mater., accepted.