Scanning Kelvin probe and photoemission electron microscopy of organic source-drain structures

Synthetic Metals

Volumn 146, Issue 3, 2004, Pages 377-382

  Muller K ^a   Goryachko, A ^a   Burkov, Y ^a   Schwiertz, C ^a   Ratzke, M ^a   Koble J ^b   Reif, J ^a   Schmeisser D ^a  

^a BRANDENBURG UNIVERSITY OF TECHNOLOGY   (Germany)

^b Omikron NanoTechnology GmbH   (Germany)

Author keywords

OFET; Photoemission electron microscopy (PEEM); Scanning Kelvin probe microscopy (SKPM)

Indexed keywords

COMPOSITION; COMPUTER SIMULATION; ELECTRIC POTENTIAL; ELECTRON MICROSCOPY; SCANNING; SURFACE ROUGHNESS;

ORGANIC FIELD EFFECT TRANSISTORS (OFET); PHOTOEMISSION ELECTRON MICROSCOPY (PEEM); SCANNING KELVIN PROBE MICROSCOPY (SKPM); SURFACE POTENTIALS;

FIELD EFFECT TRANSISTORS;

EID: 9344271187     PISSN: 03796779     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.synthmet.2004.08.022     Document Type: Conference Paper

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