In vitro exposure apparatus for ELF magnetic fields

Bioelectromagnetics

Volumn 25, Issue 8, 2004, Pages 582-591

  Schuderer, Jürgen ^a,b   Oesch, Walter ^a   Felber, Norbert ^a   Spät, Denis ^a   Kuster, Niels ^a  

^a ETH ZURICH   (Switzerland)

^b FOUNDATION FOR RESEARCH ON INFORMATION TECHNOLOGIES IN SOCIETY IT IS   (Switzerland)

Author keywords

Dosimetry; Extremely low frequency; Uniform magnetic fields

Indexed keywords

DOSIMETRY; MAGNETIC FIELDS;

B-FIELDS; COIL SYSTEMS; EXTREMELY LOW FREQUENCIES; EXTREMELY LOW FREQUENCY MAGNETIC FIELDS; FIELD EXPOSURE; HIGH-PRECISION; IN-VITRO; UNIFORM MAGNETIC FIELDS; VITRO EXPOSURE APPARATUS; VITRO STUDIES;

ACCELERATION;

ACCELERATION; ARTICLE; ARTIFACT; CALCULATION; COIL SYSTEM; COMPUTER SYSTEM; DOSIMETRY; ELECTRONICS; ENVIRONMENT; EQUIPMENT; EXPOSURE; EXPOSURE APPARATUS; EXPOSURE SYSTEM; EXTREMELY LOW FREQUENCY MAGNETIC FIELD; FIELD EXPOSURE; FIELD TOLERANCE; IN VITRO STUDY; INCUBATOR; MAGNETIC FIELD; MODEL; MONITORING; PARAMETER; PRIORITY JOURNAL; SIMULATION; TEMPERATURE; UNCERTAINTY; UNIFORM MAGNETIC FIELD; VALIDATION PROCESS; VIBRATION; WAVEFORM;

EID: 9244226548     PISSN: 01978462     EISSN: None     Source Type: Journal    
DOI: 10.1002/bem.20037     Document Type: Article

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