Process optimization and PFC emission reduction using a c-C 4F8 chamber cleaning process on a novellus concept 1 dielectric PECVD tool

IEEE Transactions on Semiconductor Manufacturing

Volumn 17, Issue 4, 2004, Pages 497-503

  Chan, Elvis M ^a   Loh, Gary ^b   Allgood, Charles C ^b  

^a NEC Corporation of America   (United States)

^b DUPONT COMPANY   (United States)

Author keywords

C4F8; Chamber cleaning; COO; Emissions; Perfluorocompound (PFC); Plasma enhanced chemical vapor deposition (PECVD)

Indexed keywords

CHEMICAL CLEANING; CHEMICAL VAPOR DEPOSITION; DATA REDUCTION; FLOW OF FLUIDS; GASES; OPTIMIZATION; PARTICULATE EMISSIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

CHAMBER CLEANING; GAS CONSUMPTION; PERFLUOROCOMPOUND (PFC) EMISSIONS; WAFER FABRICATION;

FLUORINE COMPOUNDS;

EID: 9144267146     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2004.835712     Document Type: Article

References (7)

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