Efficient Bragg grating fabrication in Ge-rich fibre by high-intensity femtosecond 264 nm irradiation

Electronics Letters

Volumn 40, Issue 23, 2004, Pages 1472-1474

  Slattery, S A ^a   Nikogosyan, D N ^a   Plougmann, N ^b   Sorensen H R ^b   Kristensen, M ^b  

^a UNIVERSITY COLLEGE CORK   (Ireland)

^b TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; DISPERSION (WAVES); GERMANIUM; IRRADIATION; MODULATION; PHOTOSENSITIVITY; REFRACTIVE INDEX; SEMICONDUCTOR DOPING; ULTRAVIOLET RADIATION;

ABSORPTION BAND; BRAGG GRATING; CLADDING; GERMANIUM SITES;

DIFFRACTION GRATINGS;

EID: 9144247164     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:20046502     Document Type: Article

References (9)

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4. Dragomir, A., Nikogosyan, D.N., and Brambilla, O.: 'Increased photosensitivity of Ge-doped and Ge, Sn-doped fibres under high-intensity 264 nm laser light', Electron. Lett., 2003, 39, (20) pp. 1437-1438
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