Biotreatment of copper and isopropyl alcohol in waste from semiconductor manufacturing

IEEE Transactions on Semiconductor Manufacturing

Volumn 17, Issue 4, 2004, Pages 538-543

  Ruiz, Arturo ^a   Ogden, Kimberly L ^a  

^a UNIVERSITY OF ARIZONA   (United States)

Author keywords

Biotreatment; Copper chemical mechanical planarization (Cu CMP) waste; Isopropyl alcohol (IPA); Semiconductor manufacturing

Indexed keywords

ALCOHOLS; BACTERIA; BIODEGRADATION; COPPER; INTEGRATED CIRCUIT MANUFACTURE; SEMICONDUCTOR DEVICE MANUFACTURE; WASTEWATER;

BIOTREATMENT; CHEMICAL-MECHANICAL PLANARIZATION (CMP); ELECTROCOAGULATION; ISOPROPYL ALCOHOL (IPA);

WASTE TREATMENT;

EID: 9144246366     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2004.835708     Document Type: Article

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