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Volumn 16, Issue 19, 2004, Pages 1732-1736

Selective formation of inverted opals by electron-beam lithography

Author keywords

[No Author keywords available]

Indexed keywords

BRAGG CELLS; CHEMICAL VAPOR DEPOSITION; CRYSTAL DEFECTS; ELECTROMAGNETIC WAVE DIFFRACTION; ELECTRON BEAM LITHOGRAPHY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HIGH RESOLUTION ELECTRON MICROSCOPY; OPTICAL MICROSCOPY; OPTOELECTRONIC DEVICES; PHOTONS; RAPID THERMAL ANNEALING; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY;

EID: 9144235647     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200400285     Document Type: Article
Times cited : (25)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.