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Volumn 16, Issue 19, 2004, Pages 1732-1736
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Selective formation of inverted opals by electron-beam lithography
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Author keywords
[No Author keywords available]
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Indexed keywords
BRAGG CELLS;
CHEMICAL VAPOR DEPOSITION;
CRYSTAL DEFECTS;
ELECTROMAGNETIC WAVE DIFFRACTION;
ELECTRON BEAM LITHOGRAPHY;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
HIGH RESOLUTION ELECTRON MICROSCOPY;
OPTICAL MICROSCOPY;
OPTOELECTRONIC DEVICES;
PHOTONS;
RAPID THERMAL ANNEALING;
REFRACTIVE INDEX;
SCANNING ELECTRON MICROSCOPY;
OPTICAL CONTRAST;
PATTERN ORIENTATIONS;
PHOTONIC BANDGAP (PBG);
PHOTONIC CRYSTALS (PC);
CRYSTAL STRUCTURE;
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EID: 9144235647
PISSN: 09359648
EISSN: None
Source Type: Journal
DOI: 10.1002/adma.200400285 Document Type: Article |
Times cited : (25)
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References (15)
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