Evaluation of acid diffusion in chemically amplified resist using interdigitated array electrode

Journal of Photopolymer Science and Technology

Volumn 6, Issue 1, 1993, Pages 31-38

  Nakamura, Jiro ^a   Ban, Hiroshi ^a   Tanaka, Akinobu ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 8944246164     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.6.31     Document Type: Article

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