Preparation and characterization of vacuum deposited semiconducting nanocrystalline polymeric thin film sensors for detection of HCl

Polymer

Volumn 45, Issue 25, 2004, Pages 8623-8628

  Misra, S C K ^a   Mathur, Prafull ^a   Yadav, Maneesha ^a   Tiwari, M K ^a   Garg, S C ^a   Tripathi, P ^b  

^a NATIONAL PHYSICAL LABORATORY   (India)

^b INDIRA GANDHI NATIONAL OPEN UNIVERSITY   (India)

Author keywords

Copolymer; Nanocomposite; Semiconducting

Indexed keywords

COPOLYMERS; DEPOSITION; FORMALDEHYDE; GLASS; HAZARDOUS MATERIALS; HYDROCHLORIC ACID; MICA; NANOSTRUCTURED MATERIALS; POLYMERIZATION; SEMICONDUCTING FILMS; SYNTHESIS (CHEMICAL); THIN FILMS; VACUUM;

HAZARDOUS SPECIES DETECTION; NANOCOMPOSITE COPOLYMER; STRUCTURAL CHARACTERIZATION;

POLYMERS;

ALUMINUM DERIVATIVE; ANILINE; COPOLYMER; FORMALDEHYDE; GLASS; HYDROCHLORIC ACID; IRON COMPLEX; MICA;

AIR; ARTICLE; CHEMICAL STRUCTURE; COMPOSITE MATERIAL; COST EFFECTIVENESS ANALYSIS; CRYSTALLIZATION; DANGEROUS GOODS; DEVICE; ELECTRIC CONDUCTIVITY; ELECTRONIC SENSOR; ENVIRONMENTAL MONITORING; EVAPORATION; FILM; GAS; POLYMERIZATION; ROOM TEMPERATURE; SENSITIVITY ANALYSIS; SENSITIVITY AND SPECIFICITY; SYNTHESIS; TEMPERATURE; THERMOSTABILITY; TIME; VACUUM;

POLYMER SCIENCE;

EID: 8844228195     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.polymer.2004.10.010     Document Type: Article

References (21)

1. C.S.C. De-Castro, A.C.P. De-Azevedo, E.E.C. Monteiro, R.R. Pinho, and G.G.B. De-Souza Polym Degrad Stab 71 2001 233 237
2. R. Zimmerling, U. Dammgen, A. Kusters, L. Grunhage, and H.J. Jager Environ Pollut 91 1996 139 145
3. H. Supriyatno, M. Yamashita, K. Nakagawa, and Y. Sadaoka Sens Actuators B: Chem 85 2002 197 204
4. G. Martinelli, M.C. Carotta, M. Ferroni, M. Ferroni, and E. Traversa Sens Actuators B: Chem 55 1999 99 110
5. N.T. Kemp, G.U. Flanagan, A.B. Kaiser, H.J. Trodahl, B. Chapman, A.C. Partridge, and R.G. Buckley Synth Met 101 1999 434 435
6. J.A. Morales, and J.F. Cassidy Sens Actuators B: Chem 92 2003 345 350
7. H.J. Choi, J.W. Kim, and K. To Synth Met 101 1999 697 698
8. A.G. Macdiarmid, J.C. Chiang, M. Halpern, W.S. Huang, S.L. Mu, L.D.S. Nanayakkara, W. Wu, and S.I. Yaniger Mol Cryst Liq Cryst 121 1985 173 180
9. J.S. Han, T. Bredow, D.E. Davey, A.B. Yu, and D.E. Mulcahy Sens Actuators B: Chem 75 2001 18 23
10. B. Xu, J. Choi, A.N. Caruso, and P.A. Dowben Appl Phys Lett 80 2002 4342 4344
11. S.C.K. Misra, M.K. Ram, S.S. Panday, B.D. Malhotra, and S. Chandra Appl Phys Lett 61 1992 1219 1221
12. S.R. Vadera, A. Tuli, N. Kumar, B.B. Sharma, S.R. Gupta, P. Chanda, and P. Krishan J Phys IV 7 1997 C-1549 C-1554
13. S.C.K. Misra, N.N. Beladakere, S.S. Pandey, M.K. Ram, T.P. Sharma, B.D. Malhotra, and S. Chandra J Appl Polym Sci 50 1993 411 414
14. S.K. Sharma, and S.C.K. Misra Int J Light Electron Opt (Germany) 113 2002 351
15. S.C.K. Misra, R.P. Pant, J. Pandey, and L.N. Kumar J Magn Magn Mater 252 2002 20 22
16. D.R. Sharma, R. Mathur, S.R. Vadera, N. Kumar, and T.R.N. Kutty J Alloys Compd 358 2003 193 204
17. H. Kajii, H. Araki, K. Yoshino, A.A. Zakhidov, and M. Onada Synth Met 103 1999 2388 2391
18. D. Jeon, J. Kim, M.C. Gallagher, and R.F. Willis Science 256 1992 1662 1664
19. M. Berggren, P. Bergman, J. Fagerström, O. Inganäs, M. Andersson, H. Weman, M. Granström, S. Stafstrom, O. Wennerstrom, and T. Hjertberg Chem Phys Lett 304 1999 84 90
20. S.C.K. Misra, P. Mathur, and B.K. Srivastava Sens Actuators A: Phys 114 2004 30 35
21. M. Abe, A. Ohtani, Y. Ohmoto, S. Akazuki, M. Ezoe, H. Higuchi, K. Nakamoto, A. Okunood, and Y. Noda J Chem Soc, Chem Commun 1989 1736 1738