Surface plasma CVD as a new technological platform for Er-doped waveguide amplifiers and lasers fabrication

OSA Trends in Optics and Photonics Series

Volumn 95 B, Issue , 2004, Pages 545-547

  Kholodkov, A V ^a   Golant, K M ^a  

^a FIBER OPTICS RESEARCH CENTER   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); ERBIUM; LASER BEAMS; LUMINESCENCE; MICROWAVES; OPTICAL FIBERS; OPTICAL WAVEGUIDES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; QUANTUM EFFICIENCY; SILICATES; STOICHIOMETRY;

MICROWAVE-INDUCED PLASMA CHEMICAL DEPOSITION; SILICA GLASSES; SURFACE PLASMA CHEMICAL VAPOR DEPOSITION (SPCVD); X-RAY MICROPROBE ANALYSIS;

LIGHT AMPLIFIERS;

EID: 8744248291     PISSN: 10945695     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)

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3. 2 planar waveguides, J. Appl. Phys, 80 (1996), 5301-5308
4. M. Moisan, D. Pavy, S. Saada, P. Chollet, P. Leprince, J. Marrec, Proc. 12th European Conf. Optical Communication, Barcelona pp.19-22, (1986).
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6. E.M.Dianov, K.M.Golant, V.I.Karpov, R.R.Khrapko, A.S.Kurkov, V.N.Protopopov,"Efficient amlification in erbium-doped high-concentration fibers fabricated by reduced-pressure plasma CVD", Proc. OFC'95, San Diego CA, Technical Digest, pp. 174-175, (1995)