Non-destructive characteristics evaluation for low vacuum dry pumps in the semi-conductor manufacturing process line

Key Engineering Materials

Volumn 270-273, Issue III, 2004, Pages 2345-2350

  Lim, Jong Yeon ^a   Cheung, Wansup ^a   Chung, Kwang Hwa ^a  

^a Korea Research Institute of Standards and Science   (South Korea)

Author keywords

Anechoic Chamber; Dry Pump; Low Vacuum; Mass Flow; Pump Degradation

Indexed keywords

ANECHOIC CHAMBERS; BENCHMARKING; CONTAMINATION; CORROSION RESISTANCE; DEGRADATION; FLOW MEASUREMENT; SEMICONDUCTOR DEVICE MANUFACTURE; STANDARDS; STRUCTURAL DESIGN; VIBRATION CONTROL;

DRY PUMP; LOW VACUUM; MASS FLOW; PUMP DEGRADATION;

VACUUM PUMPS;

EID: 8644275510     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/kem.270-273.2345     Document Type: Conference Paper

References (9)

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