SiC surface nanostructures induced by self-ordering of nano-facets

Materials Science Forum

Volumn 457-460, Issue I, 2004, Pages 407-410

  Tanaka, S ^a   Nakagawa, H ^a   Suemune, I ^a  

^a HOKKAIDO UNIVERSITY   (Japan)

Author keywords

AFM; Faceting; High resolution TEM; Nanostructure; Self ordering; Self organization; SiC surface; Step step interaction; Surface phase separation; Vicinal surface

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; NANOSTRUCTURED MATERIALS; PHASE SEPARATION; SEMICONDUCTOR DEVICES; TRANSMISSION ELECTRON MICROSCOPY;

AFM; FACETING; HIGH RESOLUTION TEM; NANOSTRUCTURES; SELF-ORDERING; SELF-ORGANIZATION; SIC SURFACES; STEP-STEP INTERACTIONS; SURFACE PHASE SEPARATION; VICINAL SURFACES;

SILICON CARBIDE;

EID: 8644267580     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.457-460.407     Document Type: Conference Paper

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