Two-material, air-clad, grating-in-the-waveguide optical interconnects

Proceedings of the IEEE 2004 International Interconnect Technology Conference

Volumn , Issue , 2004, Pages 169-171

  Mule, Anthony V ^a   Villalaz, Ricardo ^a   Gaylord, Thomas K ^a   Meindl, James D ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION LOSSES; GRATING MATERIALS; PHOTOPOLYMERS; WAVEGUIDE CHANNELS;

DIFFRACTION GRATINGS; FABRICATION; INTERFACES (MATERIALS); LIGHT ABSORPTION; POLYMERS; SUBSTRATES; WAVEGUIDES;

OPTICAL INTERCONNECTS;

EID: 8644224200     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)

1. A. V. Mule' et al., Proc. Berkeley Advanced Metallization Conference, Montreal, Canada: Oct. 2003.
2. S. M. Schultz, E. N. Glytsis, and T. K. Gaylord, Opt. Lett., vol. 24, pp. 1708-1710, Dec. 1999.
3. A. V. Mule' et al., Proc. IEEE International Interconnect Technology Conference. San Francisco, CA: pp. 122-124, June 2002.