Epitaxial CrN(001) Grown and Analyzed in situ by XPS and UPS. II. Analysis of Ar+ Sputter Etched Layers

Surface Science Spectra

Volumn 7, Issue 3, 2000, Pages 262-270

  Haasch, R T ^a   Lee, T Y ^a   Gall, D ^a   Greene, J E ^a   Petrov, I ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM COMPOUNDS; MAGNESIA; NITROGEN; NITROGEN REMOVAL; RUTHERFORD BACKSCATTERING SPECTROSCOPY;

ETCHED FILMS; KΑ; PHOTOELECTRON SPECTROSCOPY (XPS); SPUTTERED LAYERS; X-RAY SOURCES; XPS DATA;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 85116929212     PISSN: 10555269     EISSN: 15208575     Source Type: Journal    
DOI: 10.1116/1.1367636     Document Type: Article

References (2)

1. R. C.Powell, G. A.Tomasch, Y. W.Kim, J. A.Thornton, and J. E.Greene, in Diamond, Silicon Carbide and Related Wide Bandgap Semiconductors, edited by J. R.Glass, R. F.Messier, and N.Fujimori (MRS, Pittsburgh, 1990), p. 525.
2. W. K.Chu, J. W.Mayer, and M. A.Nicolet, Backscattering Spectrometry (Academic, New York, 1978), p. 81.