Optimal Scaling Methodologies and Transistor Performance

Springer Series in Advanced Microelectronics

Volumn 16, Issue , 2005, Pages 143-194

  Skotnicki, T ^a   Boeuf, F ^a  

^a NONE

Author keywords

Double Gate; Equivalent Oxide Thickness; Gate Leakage; Schottky Junction; Virtual Cathode

Indexed keywords

EID: 85103592571     PISSN: 14370387     EISSN: 21976643     Source Type: Book Series    
DOI: 10.1007/3-540-26462-0_6     Document Type: Chapter

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