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Volumn 453-454, Issue , 2004, Pages
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Progress in advanced materials and processes
[No Author Info available]
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
CURRENT VOLTAGE CHARACTERISTICS;
DIAMOND FILMS;
ELECTRON GAS;
ELECTRON TRANSITIONS;
ENERGY GAP;
GALLIUM NITRIDE;
HETEROJUNCTIONS;
MATRIX ALGEBRA;
PHOTODIODES;
PIEZOELECTRICITY;
QUANTUM WELL LASERS;
SEMICONDUCTING ALUMINUM COMPOUNDS;
SEMICONDUCTING GALLIUM ARSENIDE;
THIN FILMS;
ZIRCONIA;
DIELECTRIC PERMEABILITY;
EDGE-EMITTING DEVICES;
EIREV;
ELECTRON METHANE SCATTERING;
ELECTRON SHEET DENSITIES;
LOW-PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD);
PLASMA MODELING;
QUANTUM WELL CASCADE STRUCTURES;
SUPERSYMMETRIC QUANTUM MECHANICAL (SYSYQM);
TWO-DIMENSIONAL ELECTRON GAS (2DEG);
SEMICONDUCTOR QUANTUM WELLS;
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EID: 85086640558
PISSN: 02555476
EISSN: 16629752
Source Type: Book Series
DOI: None Document Type: Conference Review |
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Times cited : (2)
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References (0)
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