Low temperature deposition of indium tin oxide films by plasma ion-assisted evaporation

Optics InfoBase Conference Papers

Volumn , Issue , 2007, Pages

  Fuchsel K ^a   Schulz, U ^a   Kaiser, N ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; CONDUCTIVE FILMS; FIBER OPTIC SENSORS; INDIUM COMPOUNDS; ION BEAM ASSISTED DEPOSITION; LIGHT INTERFERENCE; OPTICAL PROPERTIES; OXIDE FILMS; SPUTTERING; TEMPERATURE; THIN FILMS; TIN OXIDES;

CONDUCTIVE THIN FILMS; ELECTRICAL AND OPTICAL PROPERTIES; INDIUM TIN OXIDE FILMS; ITO FILMS; LOW SUBSTRATE TEMPERATURE; LOW-TEMPERATURE DEPOSITION; PLASMA ION ASSISTED DEPOSITION; PLASMA ION-ASSISTED EVAPORATION;

OPTICAL FILMS;

EID: 85086616034     PISSN: None     EISSN: 21622701     Source Type: Conference Proceeding    
DOI: 10.1364/oic.2007.thb3     Document Type: Conference Paper

References (7)

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3. S. Laux, N. Kaiser, A. Zöller, R. Götzelmann, H. Lauth, and H. Bernitzki, "Room-temperature deposition of indium tin oxide thin films with plasma ion-assited evaporation," Thin Solid Films 335,1-5 (1998).
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5. O. Stenzel, Das Dünnschichtspektrum, 1st ed. (Akademie Verlag, 1996).
6. I. Hamberg and C. G. Granqvist, "Optical Properties of transparent and heat-reflecting indium tin oxide films: The role of ionized impurity scattering," Applied Physics Letters 44(8),721-723 (1984).
7. S. Pongratz and A. Zöller, "Plasma ion-assisted deposition: A promising technique for optical coatings," J. Vac. Sci. Technol. A 10(4), 1897 (1992).