Electrical characterization of across-field lithographic performance for 256m bit dram technologies

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2512, Issue , 1995, Pages 218-225

  Iba, Junichiro ^a   Hashimoto, Kohji ^a   Ferguson, Richard A ^a   Yanagisawa, Toshiaki ^a   Samuels, Donald J ^a  

^a IBM RESEARCH   (United States)

Author keywords

Average process window; Common process window; Ed analysis; Electrical line width measurement; Mask CD deviation; MEF; OAI; PSM; Total lithographic performance

Indexed keywords

MASKS; PETROLEUM RESERVOIR EVALUATION; PHOTOLITHOGRAPHY; PHOTOMASKS; X RAYS;

COMMON PROCESS; ELECTRICAL CHARACTERIZATION; ENHANCEMENT FACTOR; LINEWIDTH MEASUREMENTS; OFF AXIS ILLUMINATION; PHASE-SHIFTING MASK; PROCESS WINDOW; TOTAL LITHOGRAPHIC PERFORMANCE;

ELECTRIC VARIABLES MEASUREMENT;

EID: 85079245146     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.212761     Document Type: Conference Paper

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