In-situ growth control of x-ray multilayers using visible light kinetic ellipsometry and grazing incidence x-ray reflectometry

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2873, Issue , 1996, Pages 113-118

  Liiken, E ^a   Ziegler, E ^a   Lingham, M ^a  

^a EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; LIGHT; MULTILAYERS; POLARIZATION; REFLECTION; REFLECTOMETERS;

GRAZING INCIDENCE; GRAZING INCIDENCE X-RAY REFLECTOMETRY; KINETIC ELLIPSOMETRY; NANO METER RANGE; PLASMA SPUTTERING; PRECISE CONTROL; W/SI MULTILAYERS; X-RAY MULTILAYERS;

X RAYS;

EID: 85075937410     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.246194     Document Type: Conference Paper

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