Integration of functional complex oxide nanomaterials on silicon

Frontiers in Physics

Volumn 3, Issue JUN, 2015, Pages

  Vila Fungueiriño, José M ^a   Bachelet, Romain ^b   Saint Girons, Guillaume ^b   Gendry, Michel ^b   Gich, Marti ^c   Gazquez, Jaume ^c   Ferain, Etienne ^d   Rivadulla, Francisco ^a   Rodriguez Carvajal, Juan ^e   Mestres, Narcis ^c   Carretero Genevrier, Adrián ^b  

^a s n   (Spain)

^b INSTITUT DES NANOTECHNOLOGIES DE LYON   (France)

^c INSTITUT DE CIÈNCIA DE MATERIALS DE BARCELONA ICMAB CSIC   (Spain)

^d UNIVERSITÉ CATHOLIQUE DE LOUVAIN   (Belgium)

^e INSTITUT LAUE LANGEVIN   (France)

Author keywords

Epitaxial growth; Quartz; Silicon; Solution chemistry

Indexed keywords

INTERFACES (MATERIALS); MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; MOLECULAR SIEVES; NANOSTRUCTURES; OXIDE FILMS; PEROVSKITE; PHYSICAL VAPOR DEPOSITION; SEMICONDUCTOR DEVICES; SILICON WAFERS; THIN FILMS;

CHEMICAL SOLUTION DEPOSITION; COMPLEX OXIDE NANOSTRUCTURES; COMPLEX OXIDES; FUNCTIONAL OXIDES; LARGE-SCALES; MOLECULAR-BEAM EPITAXY; PROPERTY; SEMICONDUCTOR PROCESSING; SOLUTION CHEMISTRY; WAFER SCALE;

QUARTZ;

EID: 85075590723     PISSN: None     EISSN: 2296424X     Source Type: Journal    
DOI: 10.3389/fphy.2015.00038     Document Type: Review

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