Preparation of nanocrystalline silicon quantum dot structure by a digital plasma process

Advances in Colloid and Interface Science

Volumn 71-72, Issue , 1997, Pages 31-47

  Oda, Shunri ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Atomic force microscopy; Coulomb blockade; Nanocrystal; Pulsed plasma process; Quantum dot; Silicon; Single electron tunneling

Indexed keywords

EID: 85063068233     PISSN: 00018686     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0001-8686(97)90008-7     Document Type: Article

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