In situ atomic force microscopy of laser-conditioned and laser-damaged HfO2/SiO2 dielectric mirror coatings

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 1624, Issue , 1992, Pages 375-385

  Staggs, M C ^a   Balooch, M ^a   Kozlowski, M R ^a   Siekhaus, W J ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; HAFNIUM OXIDES; LASER BEAMS; LASER MIRRORS; LOW-K DIELECTRIC; OPTICAL COATINGS; OPTICAL MATERIALS; OPTICAL MULTILAYERS; SILICA; SURFACE ROUGHNESS;

CONDITIONING EFFECTS; DIELECTRIC MIRROR COATING; DIELECTRIC MULTILAYERS; DIELECTRIC OPTICAL COATINGS; LASER ILLUMINATION; MORPHOLOGICAL CHANGES; SITU ATOMIC FORCE MICROSCOPY; SURFACE IRREGULARITIES;

LASER DAMAGE;

EID: 85061995727     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.60129     Document Type: Conference Paper

References (12)

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