Dielectric study of Al/Ho2O3/Al thin-film sandwiches by means of the time domain current response method

Proceedings of the 4th International Conference on Conduction and Breakdown in Solid Dielectrics, ICSD 1992

Volumn , Issue , 1992, Pages 87-91

  Wiktorczyk, T ^a   Nitsch, K ^a   Bober, Z ^a  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; DYSPROSIUM COMPOUNDS; HOLMIUM COMPOUNDS; OXIDE FILMS; RARE EARTHS; THULIUM COMPOUNDS; TIME DOMAIN ANALYSIS; YTTERBIUM COMPOUNDS;

ALUMINUM ELECTRODES; CURRENT RESPONSE; DIELECTRIC BEHAVIOR; DIELECTRIC RESPONSE; DIELECTRIC STUDIES; HOLMIUM OXIDE; INTERFACIAL PHENOMENA; RARE-EARTH METAL OXIDE;

THIN FILMS;

EID: 85059315977     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICSD.1992.224966     Document Type: Conference Paper

References (4)

1. Wlktorczyk T., Nitsch K. and Bober Z., 1988, Thin Solid Films, 157, 13-20.
2. Wiktorczyk T., 1991, Proc. of the 7-th Int. Symposium on Electrets (ISE-7), 675-680, Berlin, Germany, 25-27 Sept. 1991, ed. by Gerhard-Multhaupt R., Kunstler W., Brehmer L. and Danz R. (Cat. No. 91CH3029-6).
3. Wlktorczyk T. and Wesolowska C., 1987, Vacuum, 37, 107-109.
4. Wiktorczyk T., Bober Z. and Nitsch K., 1989, Proc. 3-rd Int.Conf. on Conduction and Breakdown in Solid Dielectrics, 202-206, Trondhelm, Norway, July 3-6, ed.by IEEE and Electrical Insulation Soc., New York, USA (Cat No. 89QH2726-8).