Ultrasonic time-of-flight method for on-line quantitation of semiconductor gases

Proceedings - IEEE Ultrasonics Symposium

Volumn , Issue , 1991, Pages 295-300

  Cadet, Gardy ^a   Valdes, J L ^a   Mitchell, J W ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC WAVE VELOCITY; ARCHITECTURAL ACOUSTICS; BINARY MIXTURES; CHEMICAL VAPOR DEPOSITION; GAS MIXTURES; SEMICONDUCTOR DEVICES; SEMICONDUCTOR MATERIALS; ULTRASONIC APPLICATIONS;

ACCURATE MEASUREMENT; CHEMICAL VAPOR DEPOSITIONS (CVD); CONCENTRATION MONITORING; INITIAL CONCENTRATION; MEASUREMENT ACCURACY; PRACTICAL SOLUTIONS; TEMPERATURE AND PRESSURES; ULTRASONIC TIME OF FLIGHTS;

GASES;

EID: 85051047610     PISSN: 10510117     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ULTSYM.1991.234173     Document Type: Conference Paper

References (8)

1. Valdes, J. L.; Cadet, G.; Mitchell, J. W., On-Demand Electrochemical Generation of Arsine, submitted to J. Electrochem. Soc.
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3. Capik, R. I.; Miller, A High Speed High Sensitivity Ultrasonic Method for Determination of Metal-Alkyl Partial Pressures, Extended Abstract, Materials Research Society. San Diego, 1989; No. A3. 7.
4. Tallman, C. R.; ISA Trans., 1977, 17 97-104.
5. Hallewell, G. D.; Crawford, G.; McShurley, D.; Oxobey, G.; Reif, R.; Nucl. Inst. and Methods in Phys. Res., 1988, A264, 219-234.
6. Thorpe, P. L. J. of Phys. E., 1969, 2 1073.
7. Bird, R. B.; Stewart, W. E.; Lightfoot, E. N., Transport Phenomena, John Wiley & Sons: New York, 1960; p. 391.
8. Braker, W.; Mossman, A. L. Matheson Gas Data Book, 6th ed.; Matheson Gas Products: New Jersey, 1980.