Silicon oxynitride formation in nitrous oxide (N2O): The role of nitric oxide (NO)

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1993, Pages 51-52

  Tobin, Philip J ^a   Okada, Yoshio ^a   Lahkotia, Vikas ^a,b   Ajuria, Sergio A ^a   Feil, William A ^a   Hegde, Rama I ^a  

^a MOTOROLA INC   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 85034559824     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/VLSIT.1993.760240     Document Type: Conference Paper

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6. T.Y. Chu, et al, JECS 138, No. 6, L13, (1991).
7. J. P. Monat, et al, Comb. Sci. and Tech. 16, p. 21. (1977).
8. E. Briner, et al, J. de Chimie Physique 23, p. 609, (1926).
9. R.M. Lewis, et al, Proc. Roy Soc.168A, p. 441, (1938)
10. K. Jones, Comprehensive Inorganic Chemistry Vol. 2, p323-334, Pergamon Press, Oxford (1973).
11. M. Bodenstein, Helv. Chim. Acta 18, p743, (1935).