Effect of rapid thermal annealing on microstructural, magnetic, and microwave properties of FeGaB alloy films

Journal of Applied Physics

Volumn 107, Issue 9, 2010, Pages 31913-

  Shah, Lubna R ^a,c   Fan, X ^a,c   Kou, X ^a,c   Wang, W G ^b,c   Zhang, Y P ^a,c   Lou, J ^d   Sun, N X ^d   Xiao, J Q ^a  

^a UNIVERSITY OF DELAWARE   (United States)

^b JOHNS HOPKINS UNIVERSITY   (United States)

^c UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^d Northeastern University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 85024820772     PISSN: 00218979     EISSN: 10897550     Source Type: Journal    
DOI: 10.1063/1.3360351     Document Type: Article

References (6)

1. A. Ustinov, G. Srinivasan, and B. A. Kalinikos, Appl. Phys. Lett. APPLAB 90, 031913 (2007).10.1063/1.2432953
2. S. X. Dong, J. F. Li, and D. Viehland, Appl. Phys. Lett. APPLAB 83, 2265 (2003).10.1063/1.1611276
3. S. X. Dong, J. F. Li, and D. Viehland, Appl. Phys. Lett. APPLAB 85, 2307 (2004).10.1063/1.1791732
4. J. Lou, R. E. Insignares, Z. Cai, K. S. Ziemer, M. Lou, and N. X. Sun, Appl. Phys. Lett. APPLAB 91, 182504 (2007).10.1063/1.2804123
5. A. E. Clark, J. B. Restorff, M. Wun-Fogle, T. A. Lograsso, and D. L. Schlagel, IEEE Trans. Magn. IEMGAQ 36, 3238 (2000).10.1109/20.908752
6. I. Kim, J. Kim, K. H. Kim, and M. Yamaguchi, IEEE Trans. Magn. IEMGAQ 40, 2706 (2004).10.1109/TMAG.2004.832129