A monte carlo model for SEM linewidth metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2196, Issue , 1994, Pages 85-96

  Lowney, Jeremiah R ^a   Postek, Michael T ^a   Viadar, Andras E ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CODES (SYMBOLS); ELECTRON BEAMS; ELECTRONS; INTEGRATED CIRCUITS; MONTE CARLO METHODS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACE ROUGHNESS; UNCERTAINTY ANALYSIS;

ADVANCED LITHOGRAPHY; BACKSCATTERED ELECTRONS; ELECTRON TRANSMISSION; LITHOGRAPHIC MASK; MEASUREMENT PROCESS; MONTE CARLO CODES; MONTE CARLO MODEL; THIN SILICON SUBSTRATE;

PROCESS CONTROL;

EID: 85024816852     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.174167     Document Type: Conference Paper

References (10)

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