Properties and applications of electron cyclotron plasma deposited SiOxNy films with graded refractive index profiles

Journal of Non-Crystalline Solids

Volumn 187, Issue , 1995, Pages 484-488

  Bulkin, Pavel V ^a   Swart, Pieter L ^a   Lacquet, Beatrys M ^a  

^a UNIVERSITY OF JOHANNESBURG   (South Africa)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 85024635585     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-3093(95)00181-6     Document Type: Article

References (12)

1. Near infrared rugate filter fabrication by ion beam assisted deposition of Si_(1−X_)NX films
2. Optical interference filters with continuous refractive index modulations by microwave plasma-assisted chemical vapor deposition
3. Codeposition of continuous composition rugate filters
4. Using apodization functions to reduce sidelobes in rugate filters
5. Synthesis of high rejection filters with the Fourier transform method
6. Rugate filter sidelobe suppression using quintic and rugated quintic matching layers