New technologies of KrF excimer laser lithography system in 0.25 micron complex circuit patterns

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1993, Pages 145-146

  Matsuo, T ^a   Yamashita, K ^a   Endo, M ^a   Hashimoto, K ^a   Koizumi, T ^a   Katsuyama, A ^a   Sasago, M ^a   Nomura, N ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 85024311863     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/VLSIT.1993.760290     Document Type: Conference Paper

References (2)

1. M. Endo et al., Tech. Dig. of IEDM, p. 45 (1992).
2. M. Endo et al., Dig. of Sympo. on VLSI Tech., p. 110 (1992).