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Volumn 7, Issue 53, 2017, Pages 33185-33193

Metal-catalyst-free growth of graphene on insulating substrates by ammonia-assisted microwave plasma-enhanced chemical vapor deposition

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CATALYSTS; DEPOSITION; FILM GROWTH; INSULATION; MICROWAVES; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES; TEMPERATURE; VAPOR DEPOSITION;

EID: 85022197222     PISSN: None     EISSN: 20462069     Source Type: Journal    
DOI: 10.1039/c7ra04162d     Document Type: Article
Times cited : (39)

References (65)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.