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Volumn 56, Issue , 2006, Pages D1-D8
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High density ECR plasmas for the production of intense highly charged ion beams
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Author keywords
Ion sources; Microwaves; Plasmas
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Indexed keywords
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EID: 85016096994
PISSN: 00114626
EISSN: 15729486
Source Type: Journal
DOI: None Document Type: Conference Paper |
Times cited : (2)
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References (10)
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