Enhancing both selectivity and coking-resistance of a single-atom Pd1/C3N4 catalyst for acetylene hydrogenation

Nano Research

Volumn 10, Issue 4, 2017, Pages 1302-1312

  Huang, Xiaohui ^a   Xia, Yujia ^a   Cao, Yuanjie ^a   Zheng, Xusheng ^a   Pan, Haibin ^a   Zhu, Junfa ^a   Ma, Chao ^b   Wang, Hengwei ^a   Li, Junjie ^a   You, Rui ^a   Wei, Shiqiang ^a   Huang, Weixin ^a,b   Lu, Junling ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

acetylene hydrogenation; atomic layer deposition; C3N4; coke formation; Pd catalyst; selectivity; single atom catalyst; support effect

Indexed keywords

ACETYLENE; ATOMIC LAYER DEPOSITION; ATOMS; CARBON NITRIDE; CATALYST SELECTIVITY; CHARGE TRANSFER; COKE; ETHYLENE; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; HYDROGENATION; LIGHTING; PALLADIUM; PHOTOELECTRON SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY;

ACETYLENE HYDROGENATION; C3N4; COKE FORMATION; PD CATALYST; SINGLE ATOMS; SUPPORT EFFECTS;

CATALYST SUPPORTS;

EID: 85013170656     PISSN: 19980124     EISSN: 19980000     Source Type: Journal    
DOI: 10.1007/s12274-016-1416-z     Document Type: Article

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