Electrodeposition of metallic multilayers by a pulse method

Reviews in Analytical Chemistry

Volumn 18, Issue 5, 1999, Pages 279-284

  Cohen, Tzipi ^a   Yahalom, Joseph ^a   Kaplan, Wayne D ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 85010789533     PISSN: 07930135     EISSN: None     Source Type: Journal    
DOI: 10.1515/REVAC.1999.18.5.279     Document Type: Article

References (5)

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2. J. Yaholm and O. Zadok, J.Mater.Sci., 22, 499 (1987), U.S. Patent 4,652,348 (1987).
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4. J. Horkans, J. Electrochem Soc., 128,45 (1981).
5. E. Chassaing, P. Nallet, and M.F. Trichet, J. Electrochem. Soc., 143, L98 (1996).