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Volumn 675, Issue , 2001, Pages W10.3.1-W10.3.6
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Incorporation of hydrogen and oxygen into (t)a-C:H thin films deposited using DECR plasma
a b a c a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 85010711319
PISSN: 02729172
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
Times cited : (4)
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References (13)
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