A new bulk-micromachining using deep RIE and wet etching for an accelerometer

IEEJ Transactions on Sensors and Micromachines

Volumn 118, Issue 9, 1998, Pages 420-424

  Lim, Geunbae ^a   Back, Seogsoon ^a   Esashi, Masayoshi ^b  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

Accelerometer; Anisotropic wet etching; Deep RIE

Indexed keywords

EID: 85010120482     PISSN: 13418939     EISSN: 13475525     Source Type: Journal    
DOI: 10.1541/ieejsmas.118.420     Document Type: Article

References (19)

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