Adsorption, X-ray diffraction, photoelectron, and atomic emission spectroscopy benchmark studies for the eighth industrial fluid properties simulation challenge

Adsorption Science and Technology

Volumn 34, Issue 1, 2016, Pages 13-41

  Ross, Richard B ^a   Aeschliman, David B ^a   Ahmad, Riaz ^b   Brennan, John K ^c   Brostrom, Myles L ^a   Frankel, Kevin A ^a   Moore, Jonathan D ^d   Moore, Joshua D ^c   Mountain, Raymond D ^e   Poirier, Derrick M ^a   Thommes, Matthias ^b   Shen, Vincent K ^e   Schultz, Nathan E ^a   Siderius, Daniel W ^e   Smith, Kenneth D ^f  

^a 3M COMPANY   (United States)

^b QUANTACHROME INSTRUMENTS   (United States)

^c U S ARMY RESEARCH LABORATORY   (United States)

^d DOW CHEMICAL COMPANY   (United States)

^e NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^f UNITED TECHNOLOGIES RESEARCH CENTER   (United States)

Author keywords

activated carbon; adsorption; BAM P109 activated carbon; Perfluorohexane

Indexed keywords

ACTIVATED CARBON; ADSORBATES; ADSORPTION; ARGON; ATOMIC EMISSION SPECTROSCOPY; CARBON DIOXIDE; EMISSION SPECTROSCOPY; FORECASTING; INDUSTRIAL EMISSIONS; PHOTOELECTRON SPECTROSCOPY; PHOTOELECTRONS; PHOTONS; X RAY DIFFRACTION;

BENCHMARK STUDY; INDUSTRIAL FLUIDS; MOLECULAR SIMULATIONS; ORGANIC ADSORBATES; PERFLUOROHEXANE; SATURATION PRESSURE; WATER ADSORPTION; X RAY MICROTOMOGRAPHY;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 85009286708     PISSN: 02636174     EISSN: 20484038     Source Type: Journal    
DOI: 10.1177/0263617415619541     Document Type: Article

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