Corrections to “effect of ir content and sputtering conditions on unidirectional anisotropy of Ni-Fe/Mn-Ir films fabricated under the extremely clean sputtering process”

IEEE Transactions on Magnetics

Volumn 36, Issue 3, 2000, Pages 612-

  Fujiwara, H ^a   Hou, C ^a   Sun, M ^a   Cho, H S ^b   Nishioka, K ^c  

^a UNIVERSITY OF ALABAMA   (United States)

^b SEAGATE TECHNOLOGY   (United States)

^c HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 85008049526     PISSN: 00189464     EISSN: 19410069     Source Type: Journal    
DOI: 10.1109/TMAG.2000.846227     Document Type: Article

References (1)

1. H. Fujiwara, IEEE Trans. Magn., vol. 35, pp. 3082–3087, Sept. 1999.