Development of a small and wide-range three-phase current sensor using an MI element

IEEE Transactions on Magnetics

Volumn 42, Issue 10, 2006, Pages 3362-3364

  Kudo, T ^a   Tsuji, N ^a   Asada, T ^a   Wakui, S ^b  

^a FUJI ELECTRIC CO   (Japan)

^b TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

Circuit; current measurement; magnetic transducers; shielding; thin film devices

Indexed keywords

EID: 85008046721     PISSN: 00189464     EISSN: 19410069     Source Type: Journal    
DOI: 10.1109/TMAG.2006.879641     Document Type: Article

References (4)

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2. Y. Suzuki, A. Hirabayashi, and K. Yamasawa, “Analysis of a zero-flux type current sensor using a hall element,” J. Magn. Soc. Jpn., vol. 17, no. 2, pp. 397–400, 1993.
3. K. Hika, T. Uchiyama, R. Shin, K. Mohri, Y. Unoki, and K. Kikuchi, “Sputtered thin-film micro-mi sensor with pulse current magnetization,” J. Magn. Soc. Jpn., vol. 21, no. 4–2, pp. 649–652, 1997.
4. T. Kudo, N. Tsuji, T. Asada, S. Sugiyama, Y. Kitaide, and Y. Takasaki, “A small, wide range three phase current sensor using an MI element,” J. Magn. Soc. Jpn., vol. 29, no. 11, pp. 997–1003, 2005.