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Volumn 28, Issue 3, 2007, Pages 235-237

High-Temperature Leakage Improvement in Metal-Insulator-Metal Capacitors by Work-Function Tuning

Author keywords

Capacitor; high temperature; metal insulator metal (MIM); Ni; thermal leakage

Indexed keywords


EID: 85008035323     PISSN: 07413106     EISSN: 15580563     Source Type: Journal    
DOI: 10.1109/LED.2007.891265     Document Type: Article
Times cited : (52)

References (16)
  • 1
    • 0032073125 scopus 로고    scopus 로고
    • High-Q capacitors implemented in a CMOS process for low-power wireless applications
    • K. O
    • C.-M. Hung, Y.-C. Ho, I.-C. Wu, and K. O, “High-Q capacitors implemented in a CMOS process for low-power wireless applications,” in Proc. IEEE MTT-S Int. Microw. Symp., 1998, pp. 505–511.
    • (1998) Proc. IEEE MTT-S Int. Microw. Symp. , pp. 505-511
    • Hung, C.-M.1    Ho, Y.-C.2    Wu, I.-C.3
  • 3
    • 0141761559 scopus 로고    scopus 로고
    • Characterization and comparison of high-κ metal-insulator-metal (MIM) capacitors in 0.13 μm Cu BEOL for mixed-mode and RF applications
    • Y. L. Tu, H. L. Lin, L. L. Chao, D. Wu, C. S. Tsai, C. Wang, C. F. Huang, C. H. Lin, and J. Sun, “Characterization and comparison of high-κ metal-insulator-metal (MIM) capacitors in 0.13 μm Cu BEOL for mixed-mode and RF applications,” in VLSI Symp. Tech. Dig., 2003, pp. 79–80.
    • (2003) VLSI Symp. Tech. Dig. , pp. 79-80
    • Tu, Y.L.1    Lin, H.L.2    Chao, L.L.3    Wu, D.4    Tsai, C.S.5    Wang, C.6    Huang, C.F.7    Lin, C.H.8    Sun, J.9
  • 4
    • 4544224739 scopus 로고    scopus 로고
    • High quality high-k MIM capacitors by Ta205/Hf02/Ta205 multilayered dielectric and NH3 plasma interface treatments for mixed-signal/RF applications
    • Y. K. Jeong, S. J. Won, D. K. Jwon, M. W. Song, W. H. Kim, O. H. Park, J. H. Jeong, H. S. Oh, H. K. Kang, and K. P. Suh, “High quality high-k MIM capacitors by Ta205/Hf02/Ta205 multilayered dielectric and NH3 plasma interface treatments for mixed-signal/RF applications,” in VLSI Symp. Tech. Dig., 2004, pp. 222–223.
    • (2004) VLSI Symp. Tech. Dig. , pp. 222-223
    • Jeong, Y.K.1    Won, S.J.2    Jwon, D.K.3    Song, M.W.4    Kim, W.H.5    Park, O.H.6    Jeong, J.H.7    Oh, H.S.8    Kang, H.K.9    Suh, K.P.10
  • 13
    • 34547756133 scopus 로고    scopus 로고
    • High performance micro-crystallized TaN/SrTiO3/TaN capacitors for analog and RF applications
    • K. C. Chiang, C. C. Huang, A. Chin, W. J. Chen, H. L. Kao, M. Hong, and J. Kwo, “High performance micro-crystallized TaN/SrTiO3/TaN capacitors for analog and RF applications,” in VLSI Symp. Tech. Dig., 2006, pp. 126–127.
    • (2006) VLSI Symp. Tech. Dig. , pp. 126-127
    • Chiang, K.C.1    Huang, C.C.2    Chin, A.3    Chen, W.J.4    Kao, H.L.5    Hong, M.6    Kwo, J.7
  • 15
    • 0034187380 scopus 로고    scopus 로고
    • Band offsets of wide-band-gap oxides and implications for future electronic devices
    • May
    • J. Robertson, “Band offsets of wide-band-gap oxides and implications for future electronic devices,” J. Vac. Sci. Technol. B, Microelectron., vol. 18, no. 3, pp. 1785–1791, May 2000.
    • (2000) J. Vac. Sci. Technol. B, Microelectron. , vol.18 , Issue.3 , pp. 1785-1791
    • Robertson, J.1
  • 16
    • 85010112326 scopus 로고
    • Handbook of Optical Constants of Solids II
    • E. D. Palik, Ed. New York: Academic
    • F. Gervais, Handbook of Optical Constants of Solids II, E. D. Palik, Ed. New York: Academic, 1991, p. 1035.
    • (1991)
    • Gervais, F.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.