Pulse height analysis using Si-pin diode of x-ray irradiated from a 2.45 GHz electron cyclotron resonance multicharged ion source

Review of Scientific Instruments

Volumn 69, Issue 2, 1998, Pages 1179-1181

  Kato, Yushi ^a   Kubo, Yoshiyuki ^a   Ishii, Shigeyuki ^a  

^a TOYAMA PREFECTURAL UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 85007636513     PISSN: 00346748     EISSN: 10897623     Source Type: Journal    
DOI: 10.1063/1.1148659     Document Type: Conference Paper

References (8)

1. R. Geller, Electron Cyclotron Resonance Ion Sources and ECR Plasma (IOP, United Kingdom, 1996).
2. A. Girard, C. Perret, C. Léct, and G. Melin, Rev. Sci. Instrum., these proceedings.
3. G. D. Shirkov, Plasma Sources Sci. Technol. PSTEEU 2, 250 (1993).
4. C. Barué, P. Briand, A. Girard, G. Melin, and G. Briffod, Rev. Sci. Instrum. RSINAK 63, 2844 (1992); G. Mank, M. Liehr, E. Salzborn, W. Pöffel, and K. H. Schartner, Proceeding of the International Conference on ECR Ion Sources and Their Applications, 1987 (unpublished), p. 564.
5. S. Ishii, Nucl. Instrum. Methods Phys. Res. B NIMBEU 55, 296 (1991).
6. R. Pras and M. Lamoureux, Proceedings of the 12th International Workshop on ECR Ion Sources, Riken, Japan, 1995 (unpublished), p. 180; G. Gaudart and A. Girard, Proceedings of the 12th International Workshop on ECR Ion Sources, p. 174.
7. M. Lamoureux, N. Avdonina, and R. H. Pratt, in Ref. 6, p. 176.
8. Y. Kato and S. Ishii, J. Phys. Soc. Jpn. JUPSAU 64, 114 (1995).