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Volumn , Issue , 1999, Pages 215-219

Adaptive circuits using pFET floating-gate devices

Author keywords

[No Author keywords available]

Indexed keywords

BEHAVIORAL RESEARCH; CONTINUOUS TIME SYSTEMS; ELECTRON INJECTION; ELECTRON TUNNELING; FIELD EFFECT TRANSISTORS; HOT ELECTRONS; LOGIC GATES; TIMING CIRCUITS; VLSI CIRCUITS; VOLTAGE DIVIDERS;

EID: 85006017281     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ARVLSI.1999.756050     Document Type: Conference Paper
Times cited : (69)

References (27)
  • 1
    • 84944812174 scopus 로고
    • A oating-gate and its application to memory devices
    • D. Kahng and S. M. Sze, "A oating-gate and its application to memory devices, " The Bell System Technical Journal, vol. 46, no. 4, 1967, pp. 1288-1295.
    • (1967) The Bell System Technical Journal , vol.46 , Issue.4 , pp. 1288-1295
    • Kahng, D.1    Sze, S.M.2
  • 6
    • 0032318298 scopus 로고    scopus 로고
    • Impact ionization and hot-electron injection derived consistently from Boltzmann transport
    • in Press
    • P. Hasler, A. Andreou, C. Diorio, B. A. Minch, and C. A. Mead, "Impact ionization and hot-electron injection derived consistently from Boltzmann transport, " VLSI Design, in Press.
    • VLSI Design
    • Hasler, P.1    Andreou, A.2    Diorio, C.3    Minch, B.A.4    Mead, C.A.5
  • 10
    • 0030100428 scopus 로고    scopus 로고
    • Translinear circuits using subthreshold oating-gate MOS transistors
    • B. A. Minch, C. Diorio, P. Hasler, and C. A. Mead, "Translinear circuits using subthreshold oating-gate MOS transistors, " Analog Integrated Circuits and Signal Processing, vol. 9, no. 2, 1996, pp 167-179. Also at http://users. ece. gatech. edu/-phasler.
    • (1996) Analog Integrated Circuits and Signal Processing , vol.9 , Issue.2 , pp. 167-179
    • Minch, B.A.1    Diorio, C.2    Hasler, P.3    Mead, C.A.4
  • 16
    • 0026121022 scopus 로고
    • A oating gate MOSFET with tunneling injector fabricated using a standard double-polysilicon CMOS process
    • A. Thomsen and M. A. Brooke, "A oating gate MOSFET with tunneling injector fabricated using a standard double-polysilicon CMOS process, " IEEE Electron Device Letters, vol. 12, 1991, pp. 111-113.
    • (1991) IEEE Electron Device Letters , vol.12 , pp. 111-113
    • Thomsen, A.1    Brooke, M.A.2
  • 17
    • 27944492851 scopus 로고
    • A functional MOS transistor featuring gate-level weighted sum and threshold operations
    • T. Shibata and T. Ohmi, "A functional MOS transistor featuring gate-level weighted sum and threshold operations, " IEEE Transactions on Electron Devices, vol. 39, no. 6, 1992, pp. 1444-1455.
    • (1992) IEEE Transactions on Electron Devices , vol.39 , Issue.6 , pp. 1444-1455
    • Shibata, T.1    Ohmi, T.2
  • 18
    • 0027590004 scopus 로고
    • UV-activated conductances allow for multiple time-scale learn-ing
    • R. G. Benson and D. A. Kerns, "UV-activated conductances allow for multiple time-scale learn-ing, " IEEE Transactions on Neural Networks, vol. 4, no. 3, 1993, pp. 434-440.
    • (1993) IEEE Transactions on Neural Networks , vol.4 , Issue.3 , pp. 434-440
    • Benson, R.G.1    Kerns, D.A.2
  • 19
    • 0028543056 scopus 로고
    • A multiple input difierential amplifier based on charge sharing on a floating-gate MOSFET
    • K. Yang and A. G. Andreou, "A Multiple Input Difierential Amplifier Based on Charge Sharing on a Floating-Gate MOSFET, " Journal of Analog Integrated Circuits and Signal Processing, vol. 6, no. 3, 1994, pp 197-208.
    • (1994) Journal of Analog Integrated Circuits and Signal Processing , vol.6 , Issue.3 , pp. 197-208
    • Yang, K.1    Andreou, A.G.2
  • 24
    • 36849097956 scopus 로고
    • Fowler-nordheim tunneling into thermally grown si02
    • M. Lenzlinger and E. H. Snow, "Fowler-Nordheim tunneling into thermally grown Si02, " Jour-nal of Applied Physics, vol. 40, no. 1, 1969, pp. 278-283.
    • (1969) Jour-nal of Applied Physics , vol.40 , Issue.1 , pp. 278-283
    • Lenzlinger, M.1    Snow, E.H.2
  • 25
    • 0028462004 scopus 로고
    • Scaling of MOS technology to submicrometer feature sizes
    • C. A. Mead, "Scaling of MOS technology to submicrometer feature sizes, " Journal of VLSI Signal Processing, vol. 8, 1994, pp. 9-25.
    • (1994) Journal of VLSI Signal Processing , vol.8 , pp. 9-25
    • Mead, C.A.1
  • 27
    • 0027239315 scopus 로고
    • Threshold voltage modeling and the subthreshold regime of op-eration of short-channel MOSFETs
    • T. A. Fjeldly and M. Shur, "Threshold voltage modeling and the subthreshold regime of op-eration of short-channel MOSFETs, " IEEE Transactions on Electron Devices, vol. 40, no. 1, 1993, pp. 137-145.
    • (1993) IEEE Transactions on Electron Devices , vol.40 , Issue.1 , pp. 137-145
    • Fjeldly, T.A.1    Shur, M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.