Robust background modelling in DIALS

Journal of Applied Crystallography

Volumn 49, Issue 6, 2016, Pages 1912-1921

  Parkhurst, James M ^a,b   Winter, Graeme ^a   Waterman, David G ^c   Fuentes Montero, Luis ^a   Gildea, Richard J ^a   Murshudov, Garib N ^b   Evans, Gwyndaf ^a  

^a DIAMOND LIGHT SOURCE LTD   (United Kingdom)

^b MRC LABORATORY OF MOLECULAR BIOLOGY   (United Kingdom)

^c RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

background modelling; generalized linear models; integration; robust outlier rejection

Indexed keywords

APPROXIMATION ALGORITHMS; INTEGRATION; MAXIMUM LIKELIHOOD; NORMAL DISTRIBUTION; PIXELS; STATISTICS; TWINNING; X RAY DIFFRACTION;

BACKGROUND MODELLING; GENERALIZED LINEAR MODEL; GENERALIZED LINEAR MODEL APPROACH; INTEGRATION PROGRAMS; OUTLIER REJECTION; REFLECTION INTENSITY; ROBUST GENERALIZED LINEAR MODELS; TRADITIONAL APPROACHES;

POISSON DISTRIBUTION;

EID: 85002572192     PISSN: 00218898     EISSN: 16005767     Source Type: Journal    
DOI: 10.1107/S1600576716013595     Document Type: Article

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