Integration feasibility of porous SiLK∗ semiconductor dielectric

Proceedings of the IEEE 2001 International Interconnect Technology Conference, IITC 2001

Volumn , Issue , 2001, Pages 253-254

  Waeterloos, J J ^a   Struyf, H ^b   Van Aelst, J ^b   Castillo, D W ^a   Lucero, S ^a   Caluwaerts, R ^b   Alaerts, C ^b   Mannaert, G ^b   Boullart, W ^b   Sleeckx, E ^b   Schaekers, M ^b   Tokel, Z ^b   Vervoort, I ^b   Steenbergen, J ^b   Sijmus, B ^b   Vos, I ^b   Meuris, M ^b   Iacopi, F ^b   Donaton, R A ^b   Van Hove, M ^b   Vanhaelemeersch, S ^b   Maex, K ^b,c   more..

^a DOW CHEMICAL COMPANY   (United States)

^b IMEC   (Belgium)

^c UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 85001139408     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IITC.2001.930076     Document Type: Conference Paper

References (2)

1. SIA Roadmap 1999
2. E. Shaffer et al, Mat. Res. Soc Symp., Vol6(12), 2000, pp1