A new failure observation in 0.10-μm-wide Cu lines using optical beam induced resistance changes (OBIRCH)

Proceedings of the IEEE 2001 International Interconnect Technology Conference, IITC 2001

Volumn , Issue , 2001, Pages 95-97

  Tagami, M ^a   Fukase, T ^b   Matsumoto, A ^b   Iguchi, M ^b   Hayashi, Y ^a   Matsubara, Y ^b  

^a System Devices and Fundamental Reserch   (Japan)

^b NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 85001137402     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IITC.2001.930028     Document Type: Conference Paper

References (4)

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3. S. A. Srolovitz, S. A. Safran, J. Appl. Phys. 60(1), 247, (1986)
4. K. Nikawa et al., 1996 Proc Int., 263, (1995)