Determination of trace metals on a silicon wafer by acid dissolution and graphite furnace AAS

BUNSEKI KAGAKU

Volumn 43, Issue 10, 1994, Pages 771-776

  Sako, Naoki ^a   Tanaka, Hiroyuki ^a   Toyoda, Minoru ^a   Naka, Jiro ^b   Kuramoto, Kazuo ^b  

^a MITSUBISHI CHEMICAL CORPORATION   (Japan)

^b MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

determination of trace metals on the silicon wafer surface; graphite furnace AAS; improvement of aluminium sensitivity by using magnesium modifier; sampling with dilute HF and H202 mixture at room temperature

Indexed keywords

EID: 84998263868     PISSN: 05251931     EISSN: None     Source Type: Journal    
DOI: 10.2116/bunsekikagaku.43.771     Document Type: Article

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