Atomic Layer Deposition for Energy and Environmental Applications

Advanced Materials Interfaces

Volumn 3, Issue 21, 2016, Pages

  Dasgupta, Neil P ^a   Li, Liang ^b   Sun, Xueliang ^c  

^a UNIVERSITY OF MICHIGAN   (United States)

^b SOOCHOW UNIVERSITY   (China)

^c UNIVERSITY OF WESTERN ONTARIO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84994318607     PISSN: None     EISSN: 21967350     Source Type: Journal    
DOI: 10.1002/admi.201600914     Document Type: Editorial

References (1)

1. September 2016, http://ipscience.thomsonreuters.com/product/web-of-science/