Progress in ArF single-layer resists

1999 International Microprocesses and Nanotechnology Conference

Volumn , Issue , 1999, Pages 74-75

  Takechi, Satoshi ^a   Otoguro, Akihiko ^a   Arita, Tadashi ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

NANOSTRUCTURED MATERIALS;

193-NM LITHOGRAPHY; CHEMICALLY AMPLIFIED RESIST; EXPOSURE SYSTEM; FINE PATTERN; HIGH RESOLUTION; HIGH SENSITIVITY; RESIST SYSTEMS; SINGLE-LAYER RESISTS;

NANOTECHNOLOGY;

EID: 84992242870     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMNC.1999.797483     Document Type: Conference Paper

References (0)