Risks of Rapid Application Development

Communications of the ACM

Volumn 43, Issue , 2000, Pages 177-188

  Agarwal, Ritu ^a   Prasad, Jayesh ^b   Tanniru, Mohan ^c   Lynch, John ^d  

^a UNIVERSITY OF MARYLAND   (United States)

^b UNIVERSITY OF DAYTON   (United States)

^c OAKLAND UNIVERSITY   (United States)

^d Vertechs Software Solutions   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84988836231     PISSN: 00010782     EISSN: 15577317     Source Type: Journal    
DOI: 10.1145/352515.352516     Document Type: Article

References (12)

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